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Course Description

Certificate III

 Scanning X-ray Photoelectron and Auger Electron Spectroscopy

  1. January 12, 2015, XPS instrumentation: X-ray source, ion gun, and electron energy analyzer (1.5h).
  2. January 12, 2015, Principle of XPS and AES analysis (1.5h)
  3. January 13 2015, Data acquisition and optimization of XPS and AES  (1.5h)
  4. January 13 2015, Depth profiling of XPS and AES with Ar ion and C60 sputtering (1.5h)
  5. January 14 2015, XPS and AES quantification analysis (1.5h)
  6. January 14 2015, XPS and AES Spectral Interpretation (1.5h)
  7. January 15 2015, Sample preparation (1.5h)
  8. January 15 2015, Cases studies on thin films (1.5h)
  9. January 16 2015, Case studies in microelectronic processing (1.5h)
  10. January 16 2015, case studies in metallic surface and ceramic coatings (1.5h)
 

 

Scanning XPS and AES/Lab

  1. January 12 2015, VersaProbe II overview and sample loading  (2h).
  2. January 12 2015, Multipak software overview (2h)
  3. January 12 2015, Introduction to peak fitting and background subtraction Part I (2h)
  4. January 13 2015, XPS spectrum acquisition and optimization (2h)
  5. January 13 2015, Peak calibration, identification, spectrum processing of XPS(2h)
  6. January 13 2015, XPS spectrum Peak fitting  (2h)
  7. January 14 2015, XPS depth profile acquisition and optimization (2h)
  8. January 14 2015, XPS spectrum processing and quantification (2h)
  9. January 14 2015, Dealing with XPS spectrum background (2h)
  10. January 15 2015, Angular Resolved XPS data acquisition and optimization (2h)
  11. January 15 2015, Depth profile data processing (2h)
  12. January 15 2015, ARXPS data processing (2h)
  13. January 16 2015, Scanning AES image and spectrum acquisition (2h)
  14. January 16 2015, AES data processing (2h)
  15. January 16 2015, Certificate Exam (1h)

 

Applies Towards the Following Certificates

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